Photo-embossed surface relief structures with an increased aspect ratios by addition of a reversible addition-fragmentation chain transfer agent

Perelaer, Jolke; Hermans, Ko; Bastiaansen, Cees W. M.; Broer, Dirk J.; Schubert, Ulrich S.

Abstract:

Photo-embossed surface relief structures with significantly increased aspect ratios are prepared by addition of a reversible addition fragmentation chain transfer agent. The aspect ratios under inert atmosphere are successfully improved by a factor of almost 10. Moreover, aspect ratios obtained under ambient circumstances, preferred for industrial applications, are also significantly enhanced.

Year:

2008

Type of Publication:

Article

Keywords:

photo-embossing; relief structure; RAFT agent; aspect ratio; diffusion

Journal:

Advanced Materials

Volume:

20

Number:

16

Pages:

3117 - 3121