Photo-embossed surface relief structures with an increased aspect ratios by addition of a reversible addition-fragmentation chain transfer agent
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Perelaer, Jolke; Hermans, Ko; Bastiaansen, Cees W. M.; Broer, Dirk J.; Schubert, Ulrich S.
- Abstract:
- Photo-embossed surface relief structures with significantly increased aspect ratios are prepared by addition of a reversible addition fragmentation chain transfer agent. The aspect ratios under inert atmosphere are successfully improved by a factor of almost 10. Moreover, aspect ratios obtained under ambient circumstances, preferred for industrial applications, are also significantly enhanced.
- Year:
- 2008
- Type of Publication:
- Article
- Keywords:
- photo-embossing; relief structure; RAFT agent; aspect ratio; diffusion
- Journal:
- Advanced Materials
- Volume:
- 20
- Number:
- 16
- Pages:
- 3117 - 3121