Nanolithography and Nanochemistry: Pprobe Related Patterning Techniques and Chemical Modification for Nanometer-sized Devices
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Wouters, Daan; Schubert, Ulrich S.
- Abstract:
- The size regime for devices produced by photolithographic techniques
is limited. Therefore, other patterning techniques have been intensively
studied to create smaller structures. Scanning-probe-based patterning
techniques, such as dip-pen lithography, local force-induced
patterning, and local-probe oxidation-based techniques are highly
promising because of their relative ease and widespread availability.
The latter of these is especially interesting because of the possibility of
producing nanopatterns for a broad range of chemical and physical
modification and functionalization processes; both the production of
nanometer-sized electronic devices and the formation of devices
involving (bio)molecular recognition and sensor applications is
possible. This Review highlights the development of various scanning
probe systems and the possibilities of local oxidation methods, as well
as giving an overview of state-of-the-art nanometer-sized devices, and
a view of future development.
- Year:
- 2004
- Type of Publication:
- Article
- Journal:
- Angewandte Chemie
- Volume:
- 116
- Pages:
- 2553 – 2559