High-Throughput Screening and Optimization of Photoembossed Relief Structures
-
Adams, Nico; Gans, Berend-Jan De; Kozodaev, Dimitri; Guerrero-Sanchez, Carlos; Bastiaansen, Cees W. M.; Broer, Dirk J.; Schubert, Ulrich S.
- Abstract:
- A methodology for the rapid design, screening, and optimization of coating systems with surface relief
structures, using a combination of statistical experimental design, high-throughput experimentation, data
mining, and graphical and mathematical optimization routines was developed. The methodology was applied
to photopolymers used in photoembossing applications. A library of 72 films was prepared by dispensing
a given amount of sample onto a chemically patterned substrate consisting of hydrophilic areas separated
by fluorinated hydrophobic barriers. Film composition and film processing conditions were determined using
statistical experimental design. The surface topology of the films was characterized by automated AFM.
Subsequently, models explaining the dependence of surface topologies on sample composition and processing
parameters were developed and used for screening a virtual 4000-membered in silico library of photopolymer
lacquers. Simple graphical optimization or Pareto algorithms were subsequently used to find an ensemble
of formulations, which were optimal with respect to a predefined set of properties, such as aspect ratio and
shape of the relief structures.
- Year:
- 2006
- Type of Publication:
- Article
- Journal:
- Journal of Combinatorial Chemistry
- Volume:
- 8
- Pages:
- 184 - 191