Fabrication of Patterned Silane Self-Assembled Monolayers by Photolithography and Surface Reactions on Silicon-oxide Substrates
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Herzer, Nicole; Höppener, Stephanie; Schubert, Ulrich S.
- Abstract:
- Self-assembled monolayers (SAMs) have received increasing attention since their introduction
30 years ago. Soon it was discovered that they can be used as alternative resist materials and are
compatible with different established lithographic techniques commonly used in silicon semiconductor
technology. Besides these possibilities to structure SAMs, other attractive properties emerged from the
use of SAMs. E.g., the introduction of addressability into the patterns by selective functionalization
with reactive precursor molecules and/or by applying suitable surface reactions was established. In this
feature we highlight developments of photolithographic techniques that have been used in combination
with SAMs serving either as resists for the patterning process or as precursor molecules for surface
reactions, which can be performed on non-structured and mainly photochemically structured surfaces
to obtain multifunctional surfaces with tunable surface properties. The aim is to provide an overview
about the versatile possibilities to use silane based SAM systems to structure silicon-oxide substrates by
introducing topographical as well as chemically heterogeneous surface structures. In particular the
chemical activation of SAMs includes a large number of functionalization concepts which are intended
to be summarized in this review. They will be introduced here according to the class of chemical
reaction that has been used. Therefore, an introduction into the plethora of possible structures,
which have been created by the combination of photolithographic structuring approaches, and the
integration of tailor made surface functionalities into these systems will be highlighted. Additionally
effective strategies to implement a diversity of chemical functionalities onto one substrate are
summarized.
- Year:
- 2010
- Type of Publication:
- Article
- Journal:
- Chemical Communications
- Volume:
- 46
- Pages:
- 5634 - 5652