Application of MALDI-MSI for Photolithographic Materials

Crecelius, Anna; Steinacker, Ralf; Meier, Alexander; Alexandrov, Theodore; J\", ; urgen Vitz, ; Schubert, Ulrich S.

Year:

2012

Type of Publication:

Article

Journal:

Analytical Chemistry

Volume:

84

Pages:

6921 - 6925

Note:

The aim of this contribution is the application of matrix-assisted laser desorption/ionization mass spectrometric imaging (MALDI-MSI) in the area of photolithographic structuring. As proof of concept, this method was used to image an UV exposed negative photoresist layer, which is generally used to manufacture printed circuit boards (PCB) for electronic components. The negative photoresist layer consisting of the main component novolac, benzophenone as the active component, and the solvent tetrahydrofuran was mixed with the matrix dithranol and the salt additive LiTFA and spin-coated onto an ITO-conductive glass slide. To imprint an image on the created surface, a transparency with a printed wiring diagram was placed on top of it and irradiated by UV light for 15 min. The inspection of the efficient imprinting of the microstructure onto the photoresist layer was performed by MALDI-MSI. This unique application represents a further step toward the surface analysis of polymer films by this emerging life science imaging technique.